- Past Issues
- e-Submission
-
2021 Impact Factor 1.766
5-Year Impact Factor 1.674
Editorial Office
- +82-2-563-0935
- +82-2-558-2230
- submission@kssse.or.kr
- https://www.kssse.or.kr/
Review
- KISE Journal of Korean Institute of Surface Engineering
- Volume 36(5); 2003
- Article
Review
KISE Journal of Korean Institute of Surface Engineering 2003;36(5):357-363. Published online: Nov, 30, -0001
a-C:H Films Deposited in the Plasma of Surface Spark Discharge at Atmospheric Pressure. Part I: Experimental Investigation
-
School of Materials Science and Engineering, ReMM, University of Ulsan;Institute of High Current Electronics SD RAS;Institute of High Current Electronics SD RAS;School of Materials Science and Engineering, ReMM, University of Ulsan;School of Materials Sci
Abstract
The aim of this work is the synthesis of a-C:H films from methane gas using surface spark discharge at the atmospheric pressure. Properties of these films have been investigated as functions of energy W delivered per a methane molecule in the discharge. T
Keywords a-C:H films;methane;atmospheric pressure;spark discharge;