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Review
- KISE Journal of Korean Institute of Surface Engineering
- Volume 37(3); 2004
- Article
Review
KISE Journal of Korean Institute of Surface Engineering 2004;37(3):146-151. Published online: Nov, 30, -0001
Low Temperature Deposition of ITO Thin Films for Flat Panel Displays by ICP Assisted DC Magnetron Sputtering
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서울대학교 재료공학부;서울대학교 재료공학부;서울대학교 재료공학부;서울대학교 재료공학부;군산대학교 재료공학과;
Abstract
Indium tin oxide (ITO) is widely used to make a transparent conducting film for various display devices and opto-electric devices. In this study, ITO films on glass substrate were fabricated by inductively coupled plasma (ICP) assisted dc magnetron sputte
Keywords Indium tin oxide (ITO);Inductively coupled plasma (ICP);Sputtering;