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Review
- KISE Journal of Korean Institute of Surface Engineering
- Volume 37(3); 2004
- Article
Review
KISE Journal of Korean Institute of Surface Engineering 2004;37(3):158-163. Published online: Nov, 30, -0001
Dependance of the Process Parameters on the Characteristic of the ITO Thin Films
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한국기술교육대학교, 신소재공학과;한국기술교육대학교, 신소재공학;한국기술교육대학교, 신소재공학과;
Abstract
ITO thin film was deposited on the glass by RF magnetron sputtering. Dependance of the process parameters such as thickness, target-to-substrate distance, substrate temperature and oxygen partial pressure on the transmittance and electrical resistance of
Keywords Indium Tin Oxide (ITO);RF Sputtering;Process parameters;Transmittance;Sheet resistance;