Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 37(3); 2004
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2004;37(3):164-168. Published online: Nov, 30, -0001

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Fabrication of Low Temperature Poly-Silicon by Inductively Coupled Plasma Assisted Magnetron Sputtering

  • 유근철;박보환;주정훈;이정중;
    서울대학교 재료공학부;서울대학교 재료공학부;군산대학교 재료공학부;서울대학교 재료공학부;
Abstract

Polycrystalline silicon thin films were deposited by inductively coupled plasma (ICP) assisted magnetron sputtering using a gas mixture of Ar and $H_2$ on a glass substrate at $250^{circ}C$. At constant Ar mass flow rate of 10 sccm,

Keywords Polycrystalline silicon;ICP magnetron sputtering;