Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 38(1); 2005
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2005;38(1):44-48. Published online: Nov, 30, -0001

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Color Difference Characterization on Nickel Silicides

  • Jung Youngsoon;Song Ohsung;Kim Dugjoong;Choi Yongyun;Kim Chongjun;
    Department of Materials Science and Engineering, University of Seoul;Department of Materials Science and Engineering, University of Seoul;Department of Materials Science and Engineering, University of Seoul;Inter-university Semiconductor Research Center,
Abstract

We prepared nickel silicide layers from p-Si(l00)/SiO₂(2000 Å)/poly-Si(700 Å)/Ni(400 Å) structures, feasible for gates in MOSFETs, by annealing them from 500℃～900℃ for 30 minutes. We measured the color coordination in visible range, cross sectional micro-

Keywords Nickel mono silicide;Gate silicide;Silicides;Color difference;NiSi/sub x/;