- Past Issues
- e-Submission
-
2021 Impact Factor 1.766
5-Year Impact Factor 1.674
Editorial Office
- +82-2-563-0935
- +82-2-558-2230
- submission@kssse.or.kr
- https://www.kssse.or.kr/
Review
- KISE Journal of Korean Institute of Surface Engineering
- Volume 38(2); 2005
- Article
Review
KISE Journal of Korean Institute of Surface Engineering 2005;38(2):55-59. Published online: Nov, 30, -0001
Optical and Electrical Properties of ITO/Ni/ITO Thin Films
-
Korea University of Technology and Education, Advanced Materials Engineering;Korea University of Technology and Education, Advanced Materials Engineering;Korea University of Technology and Education, Advanced Materials Engineering;Korea University of Tech
Abstract
ITO/Ni/ITO thin films were deposited on the PET by RF magnetron sputtering. Dependance of the process parameters such as deposition pressure, positions of Ni layer, on the transmittance, reflectance and sheet resistance of ITO/Ni/ITO film were investigate
Keywords indium Tin Oxide[ITO];RF Sputtering;Ni;Transmittance;Sheet resistance;