Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 38(2); 2005
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2005;38(2):60-64. Published online: Nov, 30, -0001

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Deposition Of $TiB_2$ Films by High Density Plasma Assisted Chemical Vapor Deposition

  • Lee S. H.;Nam K. H.;Hong S. C.;Lee J. J.;
    Plasma Surface Engineering Lab., School of Materials Science and Engineering, Seoul National University;Plasma Surface Engineering Lab., School of Materials Science and Engineering, Seoul National University;LG Production Engineering Research Center, LG E
Abstract

The ICP-CVD (inductively coupled plasma chemical vapor deposition) process was applied to the deposition of $TiB_2$ films. For plasma generation, 13.56 MHz r.f. power was supplied to 2-turn Cu coil placed inside chamber. And the gas mixture of

Keywords Titanium diboride;ICP;CVD;