Oct, 31, 2024

Vol.57 No.5

Current Issue Archives
Search
Advanced Search
Editorial Office

Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 38(2); 2005
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2005;38(2):65-68. Published online: Nov, 30, -0001

PDF

Lamellar Structured TaN Thin Films by UHV UBM Sputtering

  • Lee G. R.;Shin C. S.;Petrov I.;Greene J, E.;Lee J. J.;
    Materials Science and Engineering Department, Seoul National University;Materials Science and Engineering Department, University of illinois at Urbana-Champaign;Materials Science and Engineering Department, University of illinois at Urbana-Champaign;Mater
Abstract

The effect of crystal orientation and microstructure on the mechanical properties of $TaN_x$ was investigated. $TaN_x$ films were grown on $SiO_2$ substrates by ultrahigh vacuum unbalanced magnetron sputter deposition in m

Keywords TaN;Sputtering;Lamellar;Stress;Hardness;