Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 38(3); 2005
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2005;38(3):89-94. Published online: Nov, 30, -0001

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Reaction Stability of Co/Ni Composite Silicide on Side-wall Spacer with Silicidation Temperatures

  • Song, Oh-Sung;Kim, Sang-Yeob;Jung, Young-Soon;
    Dept. of Materials Science and Engineering, University of Seoul;Dept. of Materials Science and Engineering, University of Seoul;Dept. of Materials Science and Engineering, University of Seoul;
Abstract

We investigate the reaction stability of cobalt and nickel with side-wall materials of $SiO_2;and;Si_3N_4$. We deposited 15nm-Co and 15nm-Ni on $SiO_2(200nm)/p-type$ Si(100) and $Si_3N_4(70 nm)/p-type$ Si(100). The samples

Keywords Cobalt nickel silicide;Composite silicide;Side-Wall material;