Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 38(4); 2005
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2005;38(4):144-149. Published online: Nov, 30, -0001

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The Residual Stress Effect on Microstructure and Optical Property of ZnO Films Produced by RF Sputtering

  • Ryu, Sang;Kim, Young-Man;
    Department of Materials Science and Engineering , Mechanical Metallurgy Laboratory, Chonnam National University;Department of Materials Science and Engineering , Mechanical Metallurgy Laboratory, Chonnam National University;
Abstract

ZnO films were produced on the Si(100) and sapphire(0001) wafers by RF magnetron sputtering in terms of processing variables such as substrate temperature and RF power. The stress in films was obtained from the Stoney`s formula using a laser scanning devi

Keywords Stress;ZnO thin films;R.F. magnetron sputtering;