Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 38(5); 2005
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2005;38(5):179-182. Published online: Nov, 30, -0001

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Structure and Properties of Indium Tin Oxide Thin Films Sputtered from Different Target Densities

  • Kim Kyoo Ho;Jung Young Hee;Munir Badrul;Wibowo Rachmat Adhi;
    Yeungnam University, School of Materials Science and Engineering;LG Electronics Ins, Development Group, OLED Division;Yeungnam University, School of Materials Science and Engineering;Yeungnam University, School of Materials Science and Engineering;
Abstract

Indium Tin Oxide (ITO) thin films were deposited from various target densities ($98.7\%~99.6\%$) using RF magnetron sputtering. Effect of the sputtering target densities on the structural, electrical and optical properties of deposited ITO thin

Keywords ITO thin films;Transparent semiconductor;Sputtering;Target density;Characterization;