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KISE Journal of Korean Institute of Surface Engineering 2006;39(3):87-92. Published online: Nov, 30, -0001
The characteristic of interface layer and the effect of bias voltage on the microstructure of c-BN films were studied in the microwave plasma hot filament C.V.D process. c-BN films were deposited on a high speed steel(SKH-51) substrate by hot filament CVD
Keywords c-BN films;Bias voltage;Microwave plasma hot filament C.V.D Process;Resistance wear coating tool;