Oct, 31, 2024

Vol.57 No.5

Editorial Office

Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 39(3); 2006
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2006;39(3):98-104. Published online: Nov, 30, -0001

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Deposition of Al Doped ZnO Films Using ICP-assisted Sputtering on the Plastic Substrate

  • Jung, Seung-Jae;Han, Young-Hun;Lee, Jung-Joong;
    School of Materials Science and Engineering, Seoul National University;School of Materials Science and Engineering, Seoul National University;School of Materials Science and Engineering, Seoul National University;
Abstract

Al-doped ZnO (AZO) films were deposited on the plastic substrate by inductively coupled plasma (ICP) assisted DC magnetron sputtering. The AZO films were produced by sputtering a metallic target (Zn/Al) in a mixture of argon and oxygen gases. AZO films wi

Keywords Al-doped ZnO (AZO);Inductively coupled plasma (ICP);Reactive sputtering;Target voltage control;Plastic substrate;