Oct, 31, 2024

Vol.57 No.5

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  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 40(2); 2007
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2007;40(2):91-97. Published online: Nov, 30, -0001

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DOI : 10.5695/JKISE.2007.40.2.091

Effect of Oxygen Addition on Residual Stress Formation of Cubic Boron Nitride Thin Films

  • Jang, Hee-Yeon;Park, Jong-Keuk;Lee, Wook-Seong;Baik, Young-Joon;Lim, Dae-Soon;Jeong, Jeung-Hyun;
    Thin Film Materials Research Center, Korea Institute of Science and Technology;Thin Film Materials Research Center, Korea Institute of Science and Technology;Thin Film Materials Research Center, Korea Institute of Science and Technology;Thin Film Material
Abstract

In this study we investigated the oxygen effect on the nucleation and its residual stress during unbalanced magnetron sputtering. Up to 0.5% in oxygen flow rate, cubic phase (c-BN) was dominated with extremely small fraction of Hexagonal phase (h-BN) of i

Keywords Cubic boron nitride;Oxygen addition;Residual stress;Nucleation;