Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 40(3); 2007
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2007;40(3):117-124. Published online: Nov, 30, -0001

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DOI : 10.5695/JKISE.2007.40.3.117

A Study on the Annealed Properties of ITO Thin Film Deposited by RF-superimposed DC Reactive Magnetron Sputtering

  • Moon, Jin-Wook;Kim, Dong-Won;
    Department of Advanced Materials Engineering, Kyonggi University;Department of Advanced Materials Engineering, Kyonggi University;
Abstract

The ITO films were deposited on glass substrates by RF-superimposed dc reactive magnetron sputtering and were annealed in $N_2$ vacuum furnace with temperatures in the range of $403K{sim}573K$ for 30 minutes. Electrical, optical and

Keywords Indium tin oxide;RF-superimposed DC reactive magnetron sputtering;OLED;Resistvity;Mobility;Surface roughness;Transmittance;