Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 40(3); 2007
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2007;40(3):144-148. Published online: Nov, 30, -0001

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DOI : 10.5695/JKISE.2007.40.3.144

A Study on the Electrical Properties of ITO Thin Films with Various Oxygen Gas Flow Rate

  • Choi, Dong-H.;Keum, Min-J.;Jean, A.R.;Han, Jean-G.;
    Center for Advanced Plasma Surface Technology, SungKyunKwan University;Center for Advanced Plasma Surface Technology, SungKyunKwan University;Center for Advanced Plasma Surface Technology, SungKyunKwan University;Center for Advanced Plasma Surface Technol
Abstract

To prepare the transparent electrode for electronic devices such as flat panel or flexible displays, solar cells, and touch panels; tin doped $In_2O_3$ (ITO) films with low resistivity and a high transparency were fabricated using a facing targ

Keywords ITO;Facing targets sputtering;Mobility;Carrier concentration;