Oct, 31, 2024

Vol.57 No.5

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  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 41(2); 2008
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2008;41(2):43-47. Published online: Nov, 30, -0001

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DOI : 10.5695/JKISE.2008.41.2.043

Deposition of c-BN Films on Tungsten Carbide Insert Tool by Microwave Plasma Enhanced Chemical Vapor Deposition(MPECVD)

  • Yoon, Su-Jong;Kim, Tae-Gyu;
    Dept. of Nanomaterials Engineering, Pusan National University;Dept. of Nanosystem Engineering, Pusan National University;
Abstract

Cubic boron nitride(c-BN) films were deposited on tungsten carbide insert tool by microwave plasma enhanced chemical vapor deposition(MPECVD) from a gas mixture of triethyl borate$(B(C_2H_5O)_3)$, ammonia $(NH_3)$, hydrogen$(H_2

Keywords Insert Tool;c-BN Film;MPECVD(Microwave Plasma Enhanced Chemical Vapor Deposition);Thiethyl Borate;Adhesion;