Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 41(6); 2008
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2008;41(6):269-273. Published online: Nov, 30, -0001

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DOI : 10.5695/JKISE.2008.41.6.269

Surface Reaction of Na0.5K0.5NbO3 Thin Films in Inductively Coupled BCl3/Cl2/Ar Plasma

  • Kim, Dong-Pyo;Um, Doo-Seung;Kim, Gwan-Ha;Woo, Jong-Chang;Kim, Chang-Il;
    School of Electrical and Electronics Engineering, Chung-Ang University;School of Electrical and Electronics Engineering, Chung-Ang University;School of Electrical and Electronics Engineering, Chung-Ang University;School of Electrical and Electronics Engin
Abstract

The etch of $(Na_{0.5}K_{0.5})NbO_3$ (NKN) thin film was performed in $BCl_3/Cl_2/Ar$ inductively coupled plasma. It was found that the 1sccm addition $BCl_3$ (5%) into $Cl_2/Ar$ plasma caused a non-monotonic be

Keywords NKN;ICP;Etch;XPS;