Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 41(6); 2008
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2008;41(6):287-291. Published online: Nov, 30, -0001

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DOI : 10.5695/JKISE.2008.41.6.287

TiN Coatings by Reactive Magnetron Sputtering Under Various Substrate Bias Voltages

  • Seo, Pyong-Sup;Chun, Sung-Yong;
    Department of Advanced Materials Science and Engineering, Mokpo National University;Department of Advanced Materials Science and Engineering, Mokpo National University;
Abstract

Reactively magnetron sputtered TiN films were deposited on Si wafers under varying bias voltage and characterized by X-ray diffraction, field-emission scanning electron microscopy and Nanoindentation. The films deposited under an Ar + $N_2$ atm

Keywords Reactive magnetron sputtering;TiN coating;Substrate bias;Microstructure;