Oct, 31, 2024

Vol.57 No.5

Current Issue Archives
Search
Advanced Search
Editorial Office

Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 46(1); 2013
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2013;46(1):29-35. Published online: Nov, 30, -0001

PDF

DOI : 10.5695/JKISE.2013.46.1.029

Effect of DC Bias on the Growth of Nanocrystalline Diamond Films by Microwave Plasma CVD

  • Kim, In-Sup;Kang, Chan Hyoung;
    Department of Advanced Materials Engineering, Korea Polytechnic University;Department of Advanced Materials Engineering, Korea Polytechnic University;
Abstract

The effect of DC bias on the growth of nanocrystalline diamond films on silicon substrate by microwave plasma chemical vapor deposition has been studied varying the substrate temperature (400, 500, 600, and $700^{circ}C$), deposition time (0.5,

Keywords Nanocrystalline diamond;Microwave plasma CVD;Nucleation and growth;