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KISE Journal of Korean Institute of Surface Engineering 2013;46(2):68-74. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2013.46.2.068
For the coating of diamond films on WC-Co tools, a buffer interlayer is needed because Co catalyzes diamond into graphite. W and Ti were chosen as candidate interlayer materials to prevent the diffusion of Co during diamond deposition. W or Ti interlayer
Keywords Nanocrystalline diamond;Microwave plasma CVD;Coefficient of friction;Adhesion;