Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 47(2); 2014
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2014;47(2):81-85. Published online: Nov, 30, -0001

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DOI : 10.5695/JKISE.2014.47.2.081

Influence of Post-deposition Annealing Temperature on the Properties of GZO/Al Thin Film

  • Kim, Sun-Kyung;Kim, Seung-Hong;Kim, So-Young;Jeon, Jae-Hyun;Gong, Tae-Kyung;Yoon, DaeYoung;Choi, DongYong;Choi, Dong-Hyuk;Son, Dong-Il;Kim, Daeil;
    School of Materials Science and Engineering, University of Ulsan;School of Materials Science and Engineering, University of Ulsan;School of Materials Science and Engineering, University of Ulsan;School of Materials Science and Engineering, University of U
Abstract

Ga doped ZnO (GZO)/Al bi-layered films were deposited on the glass substrate by RF and DC magnetron sputtering and then vacuum annealed at different temperatures of 100, 200 and $300^{circ}C$ for 30 minutes to consider the effects of annealing

Keywords GZO;Al;Annealing temperature;XRD;Figure of merit;