Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 47(3); 2014
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2014;47(3):109-115. Published online: Nov, 30, -0001

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DOI : 10.5695/JKISE.2014.47.3.109

Indium Tin Oxide (ITO) Nano Thin Films Deposited by a Modulated Pulse Sputtering at Room Temperature

  • You, Younggoon;Jeong, Jinyong;Joo, Junghoon;
    Department of Materials Science and Engineering, Plasma Materials Research Center Kunsan National University;Department of Materials Science and Engineering, Plasma Materials Research Center Kunsan National University;Department of Materials Science and E
Abstract

High power impulse magnetron sputtering (HIPIMS), also known as the technology is called peak power density in a short period, you can get high, so high ionization sputtering rate can make. Higher ionization of sputtered species to a variety of coating ma

Keywords MPP(Modulated Pulse Power);ITO(Indium-Tin-Oxide);Resistivity;Room temperature;Transmittance;Nano thin film;