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Review
- KISE Journal of Korean Institute of Surface Engineering
- Volume 47(4); 2014
- Article
Review
KISE Journal of Korean Institute of Surface Engineering 2014;47(4):181-185. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2014.47.4.181
Characteristics of IGZO Films Formed by Room Temperature with Thermal Annealing Temperature
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LG Display Laboratory;LG Display Laboratory;LG Display Laboratory;LG Display Laboratory;LG Display Laboratory;School of Materials Science and Engineering, Kyungpook National University;
Abstract
We investigated the structural, electrical and optical characteristics of IGZO thin films deposited by a room-temperature RF reactive magnetron sputtering. The thin films deposited were annealed for 2 hours at various temperatures of 300, 400, 500 and
Keywords
IGZO film;R.F. magnetron sputtering;annealing;