Oct, 31, 2024

Vol.57 No.5

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  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 47(5); 2014
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2014;47(5):252-256. Published online: Nov, 30, -0001

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DOI : 10.5695/JKISE.2014.47.5.252

High-temperature Oxidation of the TiAlCrSiN Film Deposited on the Cemented Hard Carbide

  • Lee, Dong Bok;
    School of Advanced Materials Science & Engineering, Sungkyunkwan University;
Abstract

The TiAlCrSiN film was deposited on the WC-20%TiC-10%Co carbide, and its oxidation behavior was examined at $700-1000^{circ}C$. It displayed relatively good oxidation resistance owing to the formation of $TiO_2$, $Al_2O_3$

Keywords TiAlCrSiN film;WC-TiC-Co cemented hard carbide;Cathodic arc plasma deposition;Oxidation;