Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 47(6); 2014
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2014;47(6):311-315. Published online: Nov, 30, -0001

PDF

DOI : 10.5695/JKISE.2014.47.6.311

Electrical Properties of ITO Thin Film Deposited by Reactive DC Magnetron Sputtering using Various Sn Concentration Target

  • Kim, Min-Je;Jung, Jae-Heon;Song, Pung-Keun;
    Department of Material Science and Engineering, Pusan National University;Department of Material Science and Engineering, Pusan National University;Department of Material Science and Engineering, Pusan National University;
Abstract

Indium tin oxide (ITO) thin films (30 nm) were deposited on PET substrate by reactive DC magnetron sputtering using In/Sn(2, 5 wt.%) metal alloy target without intentionally substrate heating during the deposition under different DC powers of 70 ~ 110 W.

Keywords ITO;Reactive DC sputtering;Thin film;Post annealing;