Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 48(2); 2015
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2015;48(2):38-42. Published online: Nov, 30, -0001

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DOI : 10.5695/JKISE.2015.48.2.38

Growth of Atomic Layer Deposition Platinum on TiO2

  • Kim, Hyun Gu;Lee, Han-Bo-Ram;
    Department of Materials Science and Engineering, Incheon National University;Department of Materials Science and Engineering, Incheon National University;
Abstract

Atomic layer deposition (ALD) is essential for the fabrication of nanoscale electronic devices because it has excellent conformality, atomic scale thickness control, and large area uniformity. Metal thin films are one of the important material components

Keywords $TiO_2$;Pt;Atomic Layer Deposition;$O_3$;Nucleation;