Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 48(2); 2015
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2015;48(2):43-49. Published online: Nov, 30, -0001

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DOI : 10.5695/JKISE.2015.48.2.43

Deposition Characteristics of TiO2 Thin Films Prepared by DC Pulsed Magnetron Sputtering

  • An, Eunsol;Heo, Sung-Bo;Kim, Kyu-Sik;Jung, Uoo Chang;Park, Yong Ho;Park, In-Wook;
    Korea Institute of Industrial Technology (KITECH);Korea Institute of Industrial Technology (KITECH);Korea Institute of Industrial Technology (KITECH);Korea Institute of Industrial Technology (KITECH);School of Materials Science and Engineering, Pusan Nati
Abstract

This study reports a fabrication of $TiO_2$ on the surface of dental implants by pulsed d.c. magnetron sputtering from a Ti target. A systematic investigation on the microstructure and mechanical properties of $TiO_2$ films was carri

Keywords Titanium dioxide;D.C Pulsed Magnetron Sputtering;Oxygen partial pressure;Deposition Temperature;XRD;Contact angle;FE-SEM;