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Review
- KISE Journal of Korean Institute of Surface Engineering
- Volume 48(5); 2015
- Article
Review
KISE Journal of Korean Institute of Surface Engineering 2015;48(5):245-252. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2015.48.5.245
Chemical Vapor Deposition of Inorganic Thin Films using Atmospheric Plasma : A Review of Research Trend
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School of Advanced Materials Science and Engineering, Sungkyunkwan University (SKKU);School of Advanced Materials Science and Engineering, Sungkyunkwan University (SKKU);School of Advanced Materials Science and Engineering, Sungkyunkwan University (SKKU);
Abstract
In recent years, the cleaning and activation technology of surfaces using atmospheric plasma as well as the deposition technology for coating using atmospheric plasma have been demonstrated conclusively and drawn increasing industrial attention. Especiall
Keywords atmospheric plasma;deposition;precursor;SiOx;SiNx;