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Review
- KISE Journal of Korean Institute of Surface Engineering
- Volume 48(6); 2015
- Article
Review
KISE Journal of Korean Institute of Surface Engineering 2015;48(6):322-328. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2015.48.6.322
Diffusion Behaviors and Electrical Properties in the In-Ga-Zn-O Thin Film Deposited by Radio-frequency Reactive Magnetron Sputtering
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Analytical Technology Team, LG display;Analytical Technology Team, LG display;School of Materials Science and Engineering, Kyungpook National University;
Abstract
We investigated the diffusion behaviors, electrical properties, microstructures, and composition of In-Ga-Zn-O (IGZO) oxide thin films deposited by radio frequency reactive magnetron sputtering with increasing annealing temperatures. The samples were depo
Keywords IGZO film;annealing;diffusion;