Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 48(6); 2015
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2015;48(6):360-370. Published online: Nov, 30, -0001

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DOI : 10.5695/JKISE.2015.48.6.360

Application of Pulsed Plasmas for Nanoscale Etching of Semiconductor Devices : A Review

  • Yang, Kyung Chae;Park, Sung Woo;Shin, Tae Ho;Yeom, Geun Young;
    School of Advanced Materials Science and Engineering, SungKyunKwan University (SKKU);School of Advanced Materials Science and Engineering, SungKyunKwan University (SKKU);School of Advanced Materials Science and Engineering, SungKyunKwan University (SKKU);
Abstract

As the size of the semiconductor devices shrinks to nanometer scale, the importance of plasma etching process to the fabrication of nanometer scale semiconductor devices is increasing further and further. But for the nanoscale devices, conventional plasma

Keywords Pulse plasma;Pulsing;Etch;MRAM;DRAM;