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Review
- KISE Journal of Korean Institute of Surface Engineering
- Volume 49(1); 2016
- Article
Review
KISE Journal of Korean Institute of Surface Engineering 2016;49(1):92-97. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2016.49.1.92
Study on Electron Temperature Diagnostic and the ITO Thin Film Characteristics of the Plasma Emission Intensity by the Oxygen Gas Flow
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Department of Electrical and Biological Physics, Kwangwoon University;Department of Electrical and Biological Physics, Kwangwoon University;Department of Electrical and Biological Physics, Kwangwoon University;Department of Electrical and Biological Physi
Abstract
The plasma has been used in various industrial fields of semiconductors, displays, transparent electrode and so on. Plasma diagnostics is critical to the uniform process and the product. We use the electron temperature of the various plasma parameters for
Keywords DC-magnetron sputtering;Inductively Coupled Plasma;Double Langmuir Probe;Line ratio method;Electron temperature;