Oct, 31, 2024

Vol.57 No.5

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  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 51(4); 2018
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2018;51(4):197-201. Published online: Nov, 30, -0001

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DOI : 10.5695/JKISE.2018.51.4.197

Characterization of Electro-deposited Ni-P Layer by Using Dynamic Nano-Indentation Method

  • Jung, Moo Young;Baik, Youl;Kang, Bo Kyeong;Choi, Yong;Kwon, Hyuk Joo;
    Department of Materials Science and Engineering, Dankook University;Department of Materials Science and Engineering, Dankook University;Department of Materials Science and Engineering, Dankook University;Department of Materials Science and Engineering, Da
Abstract

Dynamic nano-indentation method was applied to characterize thin electroformed Ni-P layers. The Ni-P layers were produced in a sulphamic acid bath at $50^{circ}C$ in $0.02A/cm^2$ for 10-60 minutes. The chemical analyses by XRD and ED

Keywords Ni-P deposit;Dynamic nano-indentation method;