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Review
- KISE Journal of Korean Institute of Surface Engineering
- Volume 52(6); 2019
- Article
Review
KISE Journal of Korean Institute of Surface Engineering 2019;52(6):306-309. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2019.52.6.306
Influence of Rapid Thermal Annealing on the Opto-Electrical Performance of Ti-doped Indium Oxide Thin Films
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School of Materials Science and Engineering, University of Ulsan;School of Materials Science and Engineering, University of Ulsan;
Abstract
Titanium (Ti) doped indium oxide (In2O3) films were deposited on glass substrates by RF magnetron sputtering and the films were rapid thermal annealed at 100, 200, and 300℃, respectively to investigate the influence of the rap
Keywords TIO;Magnetron sputtering;XRD;AFM;Figure of merit;