Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 52(6); 2019
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2019;52(6):342-349. Published online: Nov, 30, -0001

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DOI : 10.5695/JKISE.2019.52.6.342

Pulsed DC Bias Effects on Substrate in TiNx Thin Film Deposition by Reactive RF Magnetron Sputtering at Room Temperature

  • Kim, Seiki;
    Engineering Ceramics Center, Korea Institute of Ceramic Engineering and Technology;
Abstract

Titanium nitride(TiN) thin films have been deposited on PEN(Polyethylene naphthalate) substrate by reactive RF(13.56 MHz) magnetron sputtering in a 25% N2/Ar mixed gas atmosphere. The pulsed DC bias voltage of -50V on substrates was applied wit

Keywords $TiN_x$;RF reactive sputtering;Pulsed substrate DC Bias;XPS depth profile;