Oct, 31, 2024

Vol.57 No.5

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  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 53(2); 2020
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2020;53(2):67-71. Published online: Nov, 30, -0001

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DOI : 10.5695/JKISE.2020.53.2.67

Microstrcture and Mechanical Properties of HfN Films Deposited by dc and Inductively Coupled Plasma Assisted Magnetron Sputtering

  • Jang, Hoon;Chun, Sung-Yong;
    Department of Advanced Materials Science and Engineering, Mokpo National University;Department of Advanced Materials Science and Engineering, Mokpo National University;
Abstract

For deposition technology using plasma, it plays an important role in improving film deposited with high ionization rate through high density plasma. Various deposition methods such as high-power impulse magnetron sputtering and ion-beam sputtering have b

Keywords Inductively coupled plasma;Inductively coupled plasma assisted magnetron sputtering;Hafnium nitride;