Oct, 31, 2024

Vol.57 No.5

Current Issue Archives
Search
Advanced Search
Editorial Office

Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 53(3); 2020
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2020;53(3):124-129. Published online: Nov, 30, -0001

PDF Full Text XML

DOI : 10.5695/JKISE.2020.53.3.124

Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices

  • Lee, Baek-Ju;Hwang, Jae-Soon;Seo, Dong-Won;Choi, Jae-Wook;
    Machinery R&D Center, Hanwha Corporation;Machinery R&D Center, Hanwha Corporation;Machinery R&D Center, Hanwha Corporation;Machinery R&D Center, Hanwha Corporation;
Abstract

This study is for the development of high temperature ALD SiO2 film process, optimized for gap-fill process in manufacturing memory products, using a space-divided PE-ALD system equipped with an independent control dual plasma system and orbita

Keywords Space-Divided PEALD;Gap-Fill;Deposition;High aspect ratio;Inhibitor;