Oct, 31, 2024

Vol.57 No.5

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  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 53(5); 2020
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2020;53(5):201-206. Published online: Nov, 30, -0001

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DOI : 10.5695/JKISE.2020.53.5.201

Anti-corrosion Properties of SiOxCy(-H) thin Films Synthesized and Oxidized by Atmospheric Pressure Dielectric Barrier Discharge

  • Kim, Gi-Taek;Kim, Yoon Kee;
    Department of Materials and Manufacturing Engineering, Hanbat National University;Department of Materials and Manufacturing Engineering, Hanbat National University;
Abstract

A SiOxCy(-H) thin film was synthesized by atmospheric pressure dielectric barrier discharge(APDBD), and a SiO2-like layer was formed on the surface of the film by oxidation treatment using oxygen plasma. Hexamethylcyclotrisiloxane was used as a

Keywords Dielectric barrier discharge;Polymerization;Anti-corrosion;Silicon dioxide;Chemical vapor deposition;