- Past Issues
- e-Submission
-
2021 Impact Factor 1.766
5-Year Impact Factor 1.674
Editorial Office
- +82-2-563-0935
- +82-2-558-2230
- submission@kssse.or.kr
- https://www.kssse.or.kr/
2021 Impact Factor 1.766
5-Year Impact Factor 1.674
KISE Journal of Korean Institute of Surface Engineering 2020;53(5):265-270. Published online: Nov, 30, -0001
DOI : 10.5695/JKISE.2020.53.5.265
We investigated mechanochemical radical, which is concomitant with chemical lift-off lithography(CLL), on the self-assembled monolayer(SAM)/electrodes and a polydimethylsiloxane(PDMS) using a colorimetric and a spectroscopic method. The 11-mercaptoundecan
Keywords Chemical Lift-Off lithography(CLL);Mechanochemistry;Self-Assembled Monolayer(SAM);Radical;Bond Breaking;