Oct, 31, 2024

Vol.57 No.5

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  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 54(2); 2021
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2021;54(2):96-101. Published online: Dec, 24, 2021

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DOI : 10.5695/JKISE.2021.54.2.96

Effect of Annealing Temperature on the Properties of NaNbO3:Eu 3+ Phosphor Thin Films Deposited on Quartz Substrates

  • Shinho Cho*
    Department of Materials Science and Engineering, Silla University, Busan 46958, Korea
Abstract

NaNbO3:Eu 3+ phosphor thin films were grown on quartz substrates by radio-frequency magnetron sputtering at a growth temperature of 100 oC, with subsequent annealing at temperatures of 800, 900, and 1000 oC. The effects of annealing temperature on th

Keywords Thin Film, Photoluminescence, Annealing