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Review
- KISE Journal of Korean Institute of Surface Engineering
- Volume 55(6); 2022
- Article
Review
KISE Journal of Korean Institute of Surface Engineering 2022;55(6):328-341. Published online: Dec, 29, 2022
DOI : 10.5695/JSSE.2022.55.6.328
Area selective atomic layer deposition via surface reaction engineering: a review
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Department of Materials Science and Engineering, Seoul National University of Science and Technology, Seoul 01811, Korea
Abstract
Area selective atomic layer deposition (AS-ALD) is a bottom-up nanopattern fabrication method that can grow the ALD films only on the desired substrate areas without using photolithography and etching processes. Particularly, AS-ALD has attracted great at
Keywords Area selective atomic layer deposition, selectivity, precursor, activation, deactivation.