The Korean Society of Surface Science and Engineering

Stainless steel used in the semiconductor industry requires high surface quality and corrosion resistance, making ultra-cleaning processes essential. This study investigated the effects of various electrolyte compositions with different ratios of phosphoric acid and sulfuric acid on the electropolishing performance and Cr/Fe ratio of stainless steel. As the phosphoric acid content increased, the optimal voltage range for maintaining stable current density narrowed, but surface roughness improved due to its oxidation-promoting effect. In contrast, higher sulfuric acid content resulted in limited improvements in surface quality and the Cr/Fe ratio. These findings present a method for optimizing electrolyte composition and passivation time to effectively enhance the surface quality and corrosion resistance of stainless steel required in the semiconductor industry.

Keywords Electropolishing; Phosphoric acid; Stainless steel; Surface roughness; Cr/Fe ratio