Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 18(3); 1985
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1985;18(3):116-124. Published online: Nov, 30, -0001

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Effects of Deposition Conditions on the Deposition rate and physical properties of $SnO_2$ film produced by CVD

  • Lee, Dong-Yun;Lee, Sang-Rae;
    Department of Metallugical Engineering Pusan National University;Department of Metallugical Engineering Pusan National University;
Abstract

Chemical vapor deposition of $SnO_2$ on Pyrex glass substrate has been investigated using $SnCl_4$ and Oxygen at relatively low temperatures(300-500$^{circ}C$). The critical flow rate, which delineated the surface reaction

Keywords