Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 20(3); 1987
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1987;20(3):106-117. Published online: Nov, 30, -0001

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Effects of Chemical Vapor Deposition Parameters on The Hardness and the Structural Characteristics of TiN Film

  • Shin, Jong-Hoon;Lee, Seong-Rae;Baek, Young-Hyun;
    Dept. of Metall. Eng. KOREA University;Dept. of Metall. Eng. KOREA University;Dept. of Metall. Eng. KOREA University;
Abstract

The microhardness and the structural characteristics of the chemically vapor deposited TiN film on the 430 stainless steel substrate have been investigated with various deposition parameters such as the deposition time, the total flow rate, the flow rate

Keywords