Oct, 31, 2024

Vol.57 No.5

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  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 23(2); 1990
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1990;23(2):18-23. Published online: Nov, 30, -0001

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Preparation of SnO$_2$ Thin Films by Chemical Vapor Deposition Using Hydrolysis of SnCla$_4$ and Gas-sensing Characterisics of the Film -Effect of Deposition Variables on the Deposition Behavior and the Electrical Resistivity of SnO<

  • 김용일;김광호;박희찬;
    부산대학교 무기재료공학과;부산대학교 무기재료공학과;부산대학교 무기재료공학과;
Abstract

Thin films of tin oxide were prepared by chemical vapor deposition (C.V>D) using the hydrolysis reaction of SnCl4, Deposition rate increased with the increase of temperature up to $500^{circ}C$and then decreased at $700^{circ}C$, D

Keywords