Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 23(3); 1990
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1990;23(3):160-166. Published online: Nov, 30, -0001

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Effects of Flow on the Chemical Vapor Deposition of Si in System SiH$_4$-H$_2$

  • 조성욱;이경우;조영환;윤종규;
    서울대학교 공과대학 금속공학과;서울대학교 공학대학 금속공학과;서울대학교 공학대학 금속공학과;서울대학교 공학대학 금속공학과;
Abstract

The effects of the variation of proedd varibles on the flow patterns and effects of the flow patterns on the deposition rate and uniformity in the Si-epitaxy CVD with SiH4 as the source of Si were studied through the calculation by use of control volume m

Keywords