Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 23(4); 1990
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1990;23(4):218-224. Published online: Nov, 30, -0001

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Silicon Nitride Thin Film Deposition Using ECR Plasma

  • 송선규;장홍영;
    한국과학기술원 물리학과;한국과학기술원 물리학과;
Abstract

Silicon nitride thin(SiNx) is deposited onto 3 inch silicon wafor using ECR plasma apparatus. For the two different plasma extraction windows size, the thin films which were deposited by changing the SiH4/N2 gas fole at at 1.5mTorr without substrate heat

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