Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 25(3); 1992
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1992;25(3):133-143. Published online: Nov, 30, -0001

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TiN coatings by HCD plasma enhanced reactive ion plating method

  • 서용운;황기웅;
    서울대학교 전기공학과;서울대학교 전기공학과;
Abstract

Titanium nitride(TiN) films have been prepared by HCD plasma enhanced reactive ion plating. Density and temperature of the plasma generated by the HCD were investigated. It was shown that parameters such as the substrate bias voltage(0 350V) and N2 flow

Keywords