Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 26(3); 1993
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1993;26(3):115-120. Published online: Nov, 30, -0001

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A study on the Improvement of Surface Topography in CVD Aluminum Thin Films

  • 김영성;이경일;주승기;
    서울대학교 대학원 금속공학과;서울대학교 대학원 금속공학과;서울대학교 대학원 금속공학과;
Abstract

Aluminum thin films were deposited on the silicon substrate by the pyrolysis of TrilsoButylAluminum (TIBA) in a cold wall LPCVD reactor. The effect of substrate on the surface topograply and the decomposition reaction was investigated. The activation ener

Keywords