Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 27(2); 1994
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1994;27(2):83-90. Published online: Nov, 30, -0001

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A Study of the mechanism for abnormal oxidation of WSi$_2$

  • 이재갑;김창렬;김우식;이정용;김차연;
    국민대학교 금속재료공학과;금성일렉트론(주);금성일렉트론(주);한국과학기술원 전자재료공학과;금성사(주);
Abstract

We have investigated the mechanism for the abnormal oxide growth occuring during oxidation of the crystalline tungsten silicide. TEM and XPS analysis reveal the abnormaly grown oxide layer consisting of crystalline $Wo_3$ and amorphous $Si

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